The LEO product line comprises several different types (LEO, LEO 532, LEO Mark) and qualifies for various applications in the field of structuring. PHOTON ENERGY particularly concentrated on investigating the process steps required for the fabrication of displays and thin film photovoltaic cells. A LEO laser based on Nd:Vanadate operating at 1064nm fits perfectly for precise structuring of TCO layers. The frequency doubled version emitting at 532nm is a good choice for selective structuring of the absorber layer and the metal plating. The smallest widths of the created patterns is in the range of 15μm. The achieved resolution strongly depends on the particular optics used. High reliability and stability proof the LEO family for this challenging field of applications.
Appropriate laser sources:
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